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在市場硅原材料持續(xù)緊張的背景下,薄膜太陽電池已成為光伏市場發(fā)展的新趨勢和新熱點。與傳統(tǒng)的單晶、多晶硅電池的制備工藝不同,制備大面積的薄膜太陽能電池成為可能。
項 目 | 指標和說明 |
光源 | 150W氙燈光纖輸出,光學穩(wěn)定度≦0.8%,可工作在斬波模式, |
測試光斑尺寸 | 3mm~10mm |
單色儀 | 三光柵DSP掃描單色儀 |
波長范圍 | 300nm~2000nm |
波長準確度 | a) ±0.3nm(1200g/mm,300nm) |
b) ±0.6nm(600g/mm,500nm) | |
c) ±0.8nm(300g/mm,1250nm) | |
掃描間隔 | 小可至0.1nm |
輸出波長帶寬 | <5 nm |
多級光譜濾除裝置 | 根據波長自動切換,消除多級光譜的影響 |
光調制頻率 | 4 - 400 Hz |
標準探測器 | 標配標準硅探測器,InGaAs探測器,含校正報告 |
偏置光源 | 150W Xenon Lamp 光纖輸出 |
數據采集裝置靈敏度 | 直流模式:100nA;交流模式:2nV |
測量重復精度 | 對太陽光譜曲線積分重復性在±1%以內 |
測量速度 | 單次光譜響應掃描<1min,IPCE完整測試<5min (步長5nm) |
X Y 自動工作臺 | 300x300mm 或 500x500mm |
單波長 QE Mapping | 速度:20 Point/Second @ 0.5 mm Step |
SCS10-X150-F300 | 150W Xenon arc lamp for probe source, optical stability ≦0.8%, Adjust mechanism: It can easy remove chopper from probe light |
a) ± 0.3nm;1200g/mm, blaze 300nm (1st grating) | |
b) ± 0.6nm;600g/mm, blaze 500nm (2nd grating) | |
c) ± 0.8nm;300g/mm, blaze 1250nm (3rd grating) | |
6 Position Filter Wheel(200-2000nm) | |
DC mode(Data Acquisition System with Pre Amplifier ) | |
AC mode( Lock-In Amplifier ) | |
Chopper | |
Short current preamplifier | |
Calibrated Si Detector | |
Calibrated InGaAs Detector | |
150W Xenon Bias Light Source with fiber output, White bias light source, optical stability ≦0.8%, with 1 inch Filter Wheel | |
XY Stage for QE Uniformity Scanning, 300mm x300mm | |
SCS10-X150-F500 | XY Stage for QE Uniformity Scanning, 500mm x500mm |
SCS10-T150-F300 | 150W Tungsten-Halogen Light Source instead of Xenon 150W Light Source. XY Stage for QE Uniformity Scanning, 500mm x500mm |
SCS10-T150-F500 | 150W Tungsten-Halogen Light Source instead of Xenon 150W Light Source. XY Stage for QE Uniformity Scanning, 500mm x500mm |